玻璃透明耐指纹技术研究

论文总字数：37638字

摘 要

玻璃广泛应用于手机屏幕、显示器屏幕和光学镜头等众多产品中，但在使用过程中会产生指纹（皮肤油脂）残留的问题，不仅影响玻璃表面的美观，还会影响其透明度和光泽度。因此，如何实现玻璃长时间耐指纹是目前相关应用产品亟待解决的技术问题。传统手机玻璃屏幕采用耐指纹油处理，但所处理的表面时效性差且耐指纹性能低，难以满足使用要求。本文针对透明玻璃的耐指纹技术开展实验研究，成功制备出了具有良好耐指纹性能的玻璃样品。

采用反应离子刻蚀技术在玻璃表面构建出纳米结构，然后进行CVD氟化改性，制备出了具有优异的疏水、疏油性能及良好耐指纹性能的玻璃表面。纳米结构的构建包括清洗、镀膜、刻蚀、除金和改性等步骤，重点研究了刻蚀过程中气氛、时间和气压对刻蚀结构的影响，以及与后续的玻璃表面疏水／疏油性及耐指纹性能的关系。

采用了SF₆ CHF₃、O₂ CHF₃和Ar CHF₃三种刻蚀气氛，研究发现在刻蚀时间均为6min，其他条件相同的情况下，O₂ CHF₃气氛条件下刻蚀的结构较为均匀，经后续工艺处理后玻璃表面具有较优异的疏水和疏油性能。对刻蚀时间的研究表明，三种刻蚀气氛条件随刻蚀时间增加，刻蚀的纳米结构均在6min时效果最好，经后续工艺处理后玻璃表面水滴接触角均达到140°以上，油（十六烷）滴接触角可达85°；当刻蚀时间继续延长，会出现过刻蚀现象，纳米结构被破坏，同时玻璃表面宏观疏水疏油性能明显下降。在O₂ CHF₃气氛下，刻蚀时间为6min条件下，发现气压为2pa时刻蚀速率最快，随着气压增大刻蚀速率下降；在采用金掩膜板做保护条件下，40pa时刻蚀效果最佳，SEM分析发现基底表面纳米结构均匀，经后续工艺处理后玻璃表面宏观疏水／疏油性能良好。

在气氛、时间和气压等工艺参数对反应离子刻蚀结构影响的研究基础上，确定了合理的工艺为刻蚀气氛O₂ CHF₃ ，刻蚀时间6min，气压为40pa，结果表明该工艺条件下所制备的纳米结构均匀，经后续工艺处理后玻璃表面宏观水滴接触角可达153°，疏油（十六烷）角可达95°，且耐指纹效果优良。

关键词：超疏水，疏油，反应离子刻蚀，耐指纹

Abstract

Glass is widely used in many products such as mobile phone screens, display screens and optical lenses, but the problem of fingerprint (skin oil) residue during use will not only affect the appearance of the glass surface, but also affect its transparency and gloss. Therefore, how to achieve long-term anti-fingerprint of glass is a problem that needs to be solved in related products. This paper has carried out research on the technology of transparent glass fingerprint resistance, and successfully prepared glass with good fingerprint resistance.

The traditional mobile phone glass screen is treated with fingerprint-resistant oil, but the treated surface has poor timeliness and low fingerprint resistance. In this paper, reactive ion etching technology was used to construct nanostructures on the glass surface, and then CVD fluorination modification was carried out to prepare glass surfaces with excellent hydrophobicity, oleophobic property and good fingerprint resistance. The construction of nanostructures includes steps of cleaning, coating, etching, gold removal and modification, focusing on the effects of atmosphere, time and pressure on the etching structure during etching, and the hydrophobic/oleophobic properties of the subsequent glass surface.

Three kinds of etching atmospheres of SF₆ CHF₃, O₂ CHF₃ and Ar CHF₃ were used. It was found that the etching time was 6 min and the other conditions were the same. Under the O₂ CHF₃ atmosphere, the structure was more uniform. The glass surface has superior hydrophobic and oleophobic properties after subsequent processing. The etching time shows that the three etching atmosphere conditions increase with the etching time, and the etched nanostructures have the best effect at 6min. After the subsequent treatment, the contact angle of the glass surface drops to 140° or more. The contact angle of oil can reach 85°; when the etching time continues to prolong, over-etching will occur, the nanostructure will be destroyed, and the macroscopic hydrophobic oleophobic performance of the glass surface will be significantly reduced .Under the O₂ CHF₃ atmosphere, the etching time is 6min. It is found that the etching rate is the fastest when the gas pressure is 2pa, and the etching rate decreases with the increase of the gas pressure. When the gold mask is used for protection, the etching is performed at 40pa. The effect was the best. SEM analysis showed that the nanostructure of the substrate surface was uniform, and the macroscopic hydrophobic/oleophobic performance of the glass surface was good after subsequent processing.

Based on the influence of process parameters such as atmosphere, time and pressure on the reactive ion etching structure, a reasonable process was determined for the etching atmosphere O₂ CHF₃. The etching time was 6 min and the gas pressure was 40 Pa. The results showed that the process conditions were The prepared nanostructures are uniform, and the macroscopic water droplet contact angle of the glass surface can reach 153° after the subsequent treatment, the oleophobic (hexadecane) angle can reach 95°, and the fingerprint resistance is excellent.

KEY WORDS: Superhydrophobic, Oleophobic, Reactive ion etching,Anti-Fingerprint

目 录

第一章 绪论 1

1.1引言 1

1.2超疏水表面 1

1.2.1超疏水表面 1

1.2.2 Wenzel模型 1

1.2.3 Cassie模型 2

1.2.4自然界中的超疏水表面 2

1.3超疏油 4

1.4指纹 5

1.4.1指纹的成分 5

1.4.2指纹形成的机制 5

1.4.3耐指纹油的基本原理及应用现状 5

1.5纳米结构的构建技术概述 6

1.5.1溶胶-凝胶法 7

1.5.2聚合反应法 7

1.5.3电纺丝法 7

1.5.4电化学法 8

1.5.5化学刻蚀法 8

1.5.6纳米压印法 8

1.5.7反应离子刻蚀法 8

1.6玻璃耐指纹的研究现状 8

1.6.1构建分层的蘑菇状微柱阵列 8

1.6.2坚韧的超双疏性涂层的制备 9

1.7本课题的研究目的及主要研究内容 11

1.7.1研究目的 11

1.7.2研究内容 11

第二章 试验材料和研究方法 12

2.1研究方案及技术路线 12

2.1.1技术路线 12

2.1.2 SEM原理 16

2.1.3 AFM原理 17

2.2试验材料及设备 17

2.2.1试验材料 17

2.2.2.试验设备 17

2.3改变刻蚀的气氛 18

2.4改变刻蚀的时长 19

2.5改变刻蚀的气压 19

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