激光干涉光刻制备纳米图形阵列

论文总字数：27750字

摘 要

激光干涉光刻技术作为一种可以在材料表面大面积加工周期性纳米结构的工艺技术，以其系统简单、无需掩膜、高效率、低成本、图形周期改变灵活等优点，具有很强的应用前景，有望在基础科学研究和商业产品得到广泛应用。

本论文在激光干涉光刻基本原理的基础上，设计并搭建了一套干涉光刻光路系统和图形测量光路系统，进行了光刻胶膜厚测控与纳米图形阵列制备的相关研究，并初步尝试了纳米图形的大面积制备。主要的研究内容及成果如下：

基于激光干涉光刻理论，对干涉光刻光路系统中的相关重要部件功能及性能进行了详细研究和选择，自主搭建了双光束光路的劳埃德镜干涉光刻系统，实现了光路系统参数按需调节；同时搭建了纳米图形阵列结构的测量光路系统，实现了所制备结构周期特性的快速准确测量。

在此基础上，对激光干涉光刻的整套工艺流程进行了系统的研究和摸索，包括光刻胶的膜厚控制、激光曝光及显影时间等，最终成功制备出了光栅、点阵等纳米图形阵列结构，并能够根据需要调节光路及工艺条件，实现了不同周期、不同占空比的纳米图形阵列结构。

关键词：光刻；激光干涉光刻；光路系统；纳米图形阵列；光栅

Abstract

Laser interference lithography, as a technology that can process periodic nanostructures in large areas on the surface of materials, has a strong research prospect and is expected to be widely promoted in basic scientific research and business due to its advantages such as simple system, no mask, high efficiency, low cost and flexible fabrication of nanostructures.

Based on the basic principles of laser interference lithography, this paper designed and built a set of optical systems for interferometric lithography and nanostructure measurement, and carried out the relevant research on the control of the photoresist thickness and the fabrication of nanostructure array, and preliminarily tried the fabrication of large area of nanostructures. The main research contents and results are as follows:

Based on the theory of laser interference photolithography, the function and performance of some important components in the interference photolithography system were studied and selected in detail. The Lloyd's interferometric photolithography system with double beams was built up independently, and the parameters of the optical system were adjusted as needed. A measuring optical system of nanostructure array is constructed to realize the rapid and accurate measurement of the periodic characteristics of the fabricated structure.

On this basis, the whole process of laser interference lithography process has been carried out, including photoresist thickness control, laser exposure and development time and so on, ultimately successful fabrication of the nanograting and nanorod arrays, and can adjust the system and process conditions to realize nanostructure arrays with different periods and duty cycles.

Keywords: lithography, laser interference lithography, optical system, nanostructure array, gratings

目 录

摘要 I

Abstract II

目 录 III

第一章 绪论 1

1.1 引言 1

1.2 常用光刻技术介绍与比较 1

1.2.1 传统紫外光刻 2

1.2.2 电子束和聚焦离子束光刻 4

1.2.3 极紫外光刻 5

1.2.4 纳米压印 6

1.2.5 激光干涉光刻 7

1.2.6 常见光刻技术的对比 7

1.3 国内外研究进展 8

1.4 研究的主要内容 9

第二章 激光干涉光刻的原理及光路系统的设计与搭建 11

2.1 激光干涉光刻的原理介绍 11

2.2 双光束激光干涉光路系统的设计 12

2.3 光路系统主要器件介绍 14

2.3.1 激光光源 14

2.3.2 光开关 15

2.3.3 激光功率计 15

2.3.4 反射镜 15

2.3.5 空间滤波器 16

2.3.6 劳埃德镜曝光台 17

2.4 纳米图形测试表征 18

2.4.1 纳米图形测量光路系统 18

2.4.2 扫描电子显微镜 19

2.5 本章小结 20

第三章 实验部分 21

3.1 实验工艺流程 21

3.2 光刻胶膜厚测控研究 22

3.2.1 光刻胶的旋涂操作 22

3.2.2 光刻胶膜厚测控实验 22

3.2.3 实验结果分析 23

3.3 光栅图形阵列的制备 24

3.3.1 光栅的制备方法与检测工具 24

3.3.2 影响光栅图形的参数分析 24

3.3.3 不同占空比光栅图形的制备 24

3.3.4 不同周期光栅图形的制备 27

3.4 点阵图形阵列的制备 29

3.5 大面积纳米图形结构制备的尝试 30

3.6 本章小结 31

第四章 总结与展望 32

4.1 总结 32

4.2 展望 32

参考文献 33

致 谢 35

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